Crystalline Structure and Surface Morphology of Tin Oxide Films Grown by DC-Reactive Sputtering

Authors

  • Nathera A.A. Al-Tememee Department of physics, College of Science, Baghdad University, Iraq Author
  • Mohammed A. Hmeed Department of physics, College of Science, Baghdad University, Iraq Author
  • Fuad T. Ibrahim Department of physics, College of Science, Baghdad University, Iraq Author

Keywords:

DC Sputtering, Reactive sputtering, Thin films, Tin oxide

Abstract

Tin oxide thin films were deposited by dc reactive sputtering system at working gas pressures of (0.015-0.15) mbar. The crystalline structure and surface morphology of the prepared SnO2 films were introduced by X-ray diffraction (XRD) and atomic force microscopy (AFM). These films showed preferred orientation in (110) plane and according to AFM micrographs, the grain sizes increased non-uniformly as working gas pressure increased.

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Published

2014-04-30

Issue

Vol.4, No.2 (Mar/Apr 2014)

Section

Articles

How to Cite

Crystalline Structure and Surface Morphology of Tin Oxide Films Grown by DC-Reactive Sputtering. (2014). International Journal of Current Engineering and Technology, 4(2), 516-519. https://ijcet.evegenis.org/index.php/ijcet/article/view/564