Structure of Carbon Nanotubes Grown by Arc-Discharge Technique under Argon, N2 and O2 Atmosphere at Different Conditions

Abstract

Carbon nanotubes powder and thin films were prepared by arc-discharge technique at room temperature on glass substrate and silicon wafer under different pressure (10-3, 10-4, and 10-5) mbar of Ar, N2 and O2 gases from graphite rode. Thickness of the film is 350nm .The nanotubes were characterized by X-ray diffraction (XRD), transmission electron microscopy (TEM), atomic force microscopy (AFM) and energy dispersion X-ray analysis (EDXA).X-ray diffraction studies under different annealing times (10, 20 and 30) minute at fixed temperatures is measured. Also effect of gas pressure on the structural of the films was examined. The XRD analysis showed that CNT powder was nearly amorphous and peaks appear which indexed on the basis of the hexagonal graphite nature of the CNT when treated in acid treatment. The XRD of CNT thin films grown in Ar and N2 atmosphere show the same results under annealing time, with contrast with O2 atmosphere.